產品說明：
雙光束測光方式 ,架設Czerny-Turner mounting光學系統, 配合低迷光繞射光柵蝕刻 與全像分光鏡技術, 可達成迷光 (stry light) : 0.005% 以下 新開發近紅外光(~1400nm)積分球系統,高動態應用能力,適合各產業需求。
產品規格：
|
Item |
UV-2600 |
|
Photometric system |
Double-beam optics |
|
Monochromator |
Czerny-Turner mounting
Single monochromator
Lo-Ray-Ligh grade blazed holographic grating |
|
Detector |
R-928 photomultiplier |
|
Light source |
50 W halogen lamp, deuterium lamp, light source auto position adjustment built in |
|
Setting wavelength range |
185 to 1400 nm
|
|
Measurement wavelength range |
185 to 900 nm
220 to 1400 nm when the ISR-2600Plus Integrating Sphere Attachment is used
|
|
Wavelength accuracy |
0.1 nm (656.1 nm D2),0.3 nm (all range) |
|
Wavelength repeatability |
0.05 nm |
|
Wavelength scanning speed |
Wavelength slew rate: about 14000 nm/min
Wavelength scan rate: about 4000 to 0.5 nm/min |
|
Wavelength setting |
At 1 nm units for scan start and scan end wavelengths, and 0.1 nm units for other wavelengths |
|
Sample compartment |
Automatic Accessory Recognition
200 (W) x 230 (L) x 170 (H) mm
Center Focus |
|
Lamp interchange wavelength |
Auto switching synchronized with wavelength; switching range selectable between 290 and 370 nm (0.1 nm step) |
|
Spectral bandwidth |
0.1, 0.2, 0.5, 1, 2, 5 nm
L2/L5 (low stray-light mode) |
|
Resolution |
0.1 nm |
|
Stray light |
Max. 0.005 % (220 nm, NaI)
Max. 0.005 % (340, 370 nm, NaNO2)
Max. 1 % (198 nm, KCl) |
|
Photometric modes |
Absorbance (Abs), transmittance (%), reflectance (%), energy (E)
Photometric range
Absorbance: -5 to 5 Abs
Transmittance, reflectance: 0 to 100000 % |
|
Photometric accuracy |
0.002 Abs (0.5 Abs)
0.003 Abs (1 Abs)
0.006 Abs (2 Abs)
0.3 %T
Measured using NIST930D/NIST1930 or equivalent filter |
|
Photometric repeatability |
0.001 Abs (0.5 Abs)
0.001 Abs (1 Abs)
0.003 Abs (2 Abs)
0.1 %T |
|
Noise level |
0.00003 Abs RMS (500 nm) |
|
Baseline flatness |
0.0003 Abs (200 to 860 nm), 1 hour after light source is turned ON |
|
Baseline stability |
Within 0.0002 Abs/h (700 nm), 1 hour after light source is turned ON |
|
Sample compartment |
Internal dimensions: W150 D260 H140 (mm)
Distance between light beams: 100 mm
Maximum optical path length of cell: 100 mm |
|
Dimensions |
W450 D600 H250 (mm) |
|
Weight |
23 kg |
|
Operating temperature |
15 to 35 C |
|
Operating humidity |
30 to 80 % (no condensation, less than 70 % above 30 C) |
|
Power requirements |
100 to 240 VAC, 50/60 Hz |
|
Power consumption |
170 VA |
應用分析：
1.電機/電子/光電業:抗反射膜及高反射鏡絕對反射分析,光學鍍膜穿透分析。
2.化學業:多元薄膜樣品穿透及反射分析, 包裝黏膜膜厚分析,塑材樣品穿透 及反射分析, 色度分析。
3.製藥/化粧品/生命科學業:原物料品管測試,酵素反應分析,蛋白質/DNA/核酸定量分析, 化粧品色度及紫外線遮蔽率分析。
4.環境:六價鉻定量分析,湖水、河川水、排放水中總磷、總氮、鐵、銅、砷及氨水定量 分析,濁度分析。
5.建築業:節能玻璃/偏光膜穿透分析。
6.紡織業:纖維布之穿透/反射及色度分析。
7.食品業:維他命、礦物質及食品添加劑定量分析,包裝材中殘留成份定量分析。
相關選購/附件：
樣品槽恆溫控制裝置
樣品吸引裝置
超微量樣品裝置
多孔槽樣品座
自動取樣連續分析裝置積分球系統
絕對反射分析裝置
Cells/Cuvettes
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