產品說明:
雙光束雙單光器測光方式 ,Czerny-Turner mounting光學系統, 配合島津專長之超低迷光繞射光柵蝕刻與全像分光鏡技術, 可達成高解析度: 0.1nm, 低迷光 (stray light) : 0.00005% 以下, 可達6-Abs高超高吸收分析應用! 嶄新精密之低背景高感度三個檢測器設計(185~3300nm),在波長850~1600nm之間,傳統設計上無法提昇效能下;增添了全世界最低噪(小於0.00003Abs/1500nm下); 最高感度的銦镓砷(InGaAs)檢測器,高動態應用能力,適合各產業需求。
產品規格:
Wavelength range |
185 nm - 3300 nm |
Spectral band width |
UV/VIS region: 0.1, 0.2, 0.5, 1, 2, 3, 5, 8 nm (8 steps)
NIR region: 0.2, 0.5, 1, 2, 3, 5, 8, 12, 20, 32 nm (10 steps) |
Resolution |
0.1 nm |
Wavelength Sampling |
0.01 to 5 nm |
Wavelength accuracy |
±0.2 nm in UV-VIS region, ±0.8 nm in NIR region |
Wavelength repeatability |
within ±0.08 nm in UV-VIS region, ±0.32 nm in NIR region
|
Wavelength scanning speed |
When moving between wavelengths:
approx. 18000 nm/min in UV-VIS region, approx. 70000 nm/min in NIR region
When scanning wavelengths:
Max. approx 4500 nm/min in UV-VIS region, Max. approx. 9000nm/min in NIR PMT/InGaAs region, Max. approx 4000 nm/min in NIR PbS region (excluding time required for switching) |
Light source switching |
The light sources are switched automatically in conjunction with wavelength scanning. The wavelength at which the light sources are switched can be freely set in a range of 282 to 393 nm in 0.1 nm increments. |
Stray light |
Max. 0.00008% (220 nm, NaI)
Max. 0.00005% (340 nm, NaNO2)
Max. 0.0005% (1420 nm, H2O)
Max. 0.005% (2365 nm, CHCl3) |
Photometric system |
Double-beam |
Photometric range |
-6 to 6 Abs |
Photometric accuracy |
±0.003 Abs (1 Abs), ±0.002 Abs (0.5 Abs) determined with NIST930D standard filter |
Photometric repeatability |
0.0008Abs (0 to 0.5 Abs), 0.0016 Abs (0.5 to 1 Abs) determined under conditions of 1 second accumulation and maximum deviation for five times measurements. |
Noise |
Under 0.00005Abs (500nm), 0.00008Abs (900nm), 0.00003Abs(1500nm)
Determined under condition of Slit width 2nm, RMS value at 1 second integration. |
Baseline flatness |
±0.004 Abs (185 to 200 nm)
±0.001 Abs (200 to 3000 nm)
±0.005 Abs (3000 to 3300 nm) |
Baseline stability |
Within 0.0002 Abs/h (after 2 hour warm-up, 500nm, 1-second accumulation) |
Light source |
50W halogen lamp (2000hours life), deuterium lamp (socket-type with 2000hours life)
Automatic position alignment is used for maximum sensitivity. |
Monochromator |
2 x 2 Grating-grating type double monochromator
Pre-monochromator: Concave diffraction grating monochromator
Main monochromator: High performance blazed holographic grating in aberration-corrected Czerny-Turner mounting |
Detectors |
UV-VIS region: Photomultiplier R-928
NIR region: InGaAs and cooled PbS |
Sample compartment |
Inside dimensions: 150W x 260D x 140H (mm) |
Dimensions |
1020W x 660D x 275H (mm) |
Weight |
96 Kg |
Ambient temperature |
15 to 35°C |
Ambient humidity |
35 to 80% (no condensation, 70% or less at temperatures of 30°C or more) |
Power requirements |
AC 100V, 120V, 220V, 230V, 240V, 50/60Hz |
Power consumption |
300VA |
應用分析:
1.電機/電子/光電業:抗反射膜及高反射鏡絕對反射分析,光學鍍膜穿透分析。 太陽能蓄電池、LCD面板穿透吸收反射分析。
2.化學業:多元薄膜樣品穿透及反射分析, 包裝黏膜膜厚分析,塑材樣品穿透 及反射分析, 色度分析。
3.製藥/化粧品/生命科學業:原物料品管測試,酵素反應分析,蛋白質/DNA/核酸定量分析, 化粧品色度及紫外線遮蔽率分析。
4.環境:六價鉻定量分析,湖水、河川水、排放水中總磷、總氮、鐵、銅、砷及氨水定量 分析,濁度分析。
5.建築業:節能玻璃/偏光膜穿透分析。
6.紡織業:纖維布之穿透/反射及色度分析。
7.食品業:維他命、礦物質及食品添加劑定量分析,包裝材中殘留成份定量分析。
相關選購/附件:
樣品槽恆溫控制裝置
樣品吸引裝置
超微量樣品裝置
多孔槽樣品座
自動取樣連續分析裝置
積分球系統
絕對反射分析裝置(固定式5°/12°/30°/45°、及可變角度5°~70°;刻度1° )
Cells/Cuvettes
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