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        光譜儀 SpectroscopyUV
品名:紫外光-可見光-近紅外光光譜儀
型號:UV-3600
 

產品說明:

雙光束雙單光器測光方式 ,Czerny-Turner mounting光學系統, 配合島津專長之超低迷光繞射光柵蝕刻與全像分光鏡技術, 可達成高解析度: 0.1nm, 低迷光 (stray light) : 0.00005% 以下, 可達6-Abs高超高吸收分析應用! 嶄新精密之低背景高感度三個檢測器設計(185~3300nm),在波長850~1600nm之間,傳統設計上無法提昇效能下;增添了全世界最低噪(小於0.00003Abs/1500nm下); 最高感度的銦镓砷(InGaAs)檢測器,高動態應用能力,適合各產業需求。



產品規格:
Wavelength range 185 nm - 3300 nm
Spectral band width UV/VIS region: 0.1, 0.2, 0.5, 1, 2, 3, 5, 8 nm (8 steps)
NIR region: 0.2, 0.5, 1, 2, 3, 5, 8, 12, 20, 32 nm (10 steps)
Resolution 0.1 nm
Wavelength Sampling 0.01 to 5 nm
Wavelength accuracy ±0.2 nm in UV-VIS region, ±0.8 nm in NIR region
Wavelength repeatability

within ±0.08 nm in UV-VIS region, ±0.32 nm in NIR region

Wavelength scanning speed When moving between wavelengths:
approx. 18000 nm/min in UV-VIS region, approx. 70000 nm/min in NIR region
When scanning wavelengths:
Max. approx 4500 nm/min in UV-VIS region, Max. approx. 9000nm/min in NIR PMT/InGaAs region, Max. approx 4000 nm/min in NIR PbS region (excluding time required for switching)
Light source switching The light sources are switched automatically in conjunction with wavelength scanning. The wavelength at which the light sources are switched can be freely set in a range of 282 to 393 nm in 0.1 nm increments.
Stray light Max. 0.00008% (220 nm, NaI)
Max. 0.00005% (340 nm, NaNO2)
Max. 0.0005% (1420 nm, H2O)
Max. 0.005% (2365 nm, CHCl3)
Photometric system Double-beam
Photometric range -6 to 6 Abs
Photometric accuracy ±0.003 Abs (1 Abs), ±0.002 Abs (0.5 Abs) determined with NIST930D standard filter
Photometric repeatability 0.0008Abs (0 to 0.5 Abs), 0.0016 Abs (0.5 to 1 Abs) determined under conditions of 1 second accumulation and maximum deviation for five times measurements.
Noise Under 0.0005Abs (500nm), 0.00008Abs (900nm), 0.00003Abs(1500nm)
Determined under condition of Slit width 2nm, RMS value at 1 second integration.
Baseline flatness ±0.004 Abs (185 to 200 nm)
±0.001 Abs (200 to 3000 nm)
±0.005 Abs (3000 to 3300 nm)
Baseline stability Within 0.0002 Abs/h (after 2 hour warm-up, 500nm, 1-second accumulation)
Light source 50W halogen lamp (2000hours life), deuterium lamp (socket-type with 2000hours life)
Automatic position alignment is used for maximum sensitivity.
Monochromator Grating-grating type double monochromator
Pre-monochromator: Concave diffraction grating monochromator  
Main monochromator: High performance blazed holographic grating in aberration-corrected Czerny-Turner mounting
Detectors UV-VIS region: Photomultiplier R-928
NIR region: InGaAs and cooled PbS
Sample compartment Inside dimensions: 150W x 260D x 140H (mm)
Dimensions 1020W x 660D x 275H (mm)
Weight 96 Kg
Ambient temperature 15 to 35°C
Ambient humidity 35 to 80% (no condensation, 70% or less at temperatures of 30°C or more)
Operating humidity 30 to 80 % (no condensation, less than 70 % above 30 C)
Power requirements AC 100V, 120V, 220V, 230V, 240V, 50/60Hz
Power consumption 300VA

 



應用分析:

1.電機/電子/光電業:抗反射膜及高反射鏡絕對反射分析,光學鍍膜穿透分析。 太陽能蓄電池、LCD面板穿透吸收反射分析。
2.化學業:多元薄膜樣品穿透及反射分析, 包裝黏膜膜厚分析,塑材樣品穿透 及反射分析, 色度分析。
3.製藥/化粧品/生命科學業:原物料品管測試,酵素反應分析,蛋白質/DNA/核酸定量分析, 化粧品色度及紫外線遮蔽率分析。
4.環境:六價鉻定量分析,湖水、河川水、排放水中總磷、總氮、鐵、銅、砷及氨水定量 分析,濁度分析。
5.建築業:節能玻璃/偏光膜穿透分析。
6.紡織業:纖維布之穿透/反射及色度分析。
7.食品業:維他命、礦物質及食品添加劑定量分析,包裝材中殘留成份定量分析。



相關選購/附件:

樣品槽恆溫控制裝置
樣品吸引裝置
超微量樣品裝置
多孔槽樣品座
自動取樣連續分析裝置
積分球系統
絕對反射分析裝置(固定式5°/12°/30°/45°、及可變角度5°~70°;刻度1° )

Cells/Cuvettes